School of Basic Sciences, Indian Institute of Technology Mandi Indian Institute of Technology Mandi, Kamand CampusMandi, Himachal Pradesh, India - 175005
A New Class Of Non-chemically Amplified Molecular Photoresists For Next Generation Integrated Circuits (Ics) Technology
Chullikkattil P. Pradeep, Kenneth E. Gonsalves, Midathala Yogesh, Neha Thakur, Pulikanti Guruprasad Reddy, Santu Nandi, Satinder K. Sharma, Subrata Ghosh
Chemical Sciences
Published
Filed 2016-12-24
Published 2018-03-02
A Process For I- Line Resist Dissolution Modulation Using Hydroxy-polymer
Santu Nandi, Lalit Killare, M Yogesh, Suman Dolai, Chullikkattil P Pradeep, Satinder Sharma, Anvesh Bogavelly, Deep Narayan Tiwari, Paritosh Jain, Subrata Ghosh, Kenneth E Gonsalves, Surinder Singh
Patent No. 391608
Chemical Sciences
Granted
Filed 2021-02-23
Published 2021-02-26
A New Class Of Non-chemically Amplified Molecular Photoresists For Next Generation Integrated Circuits (Ics) Technology
Chullikkattil P. Pradeep, Kenneth E. Gonsalves, Midathala Yogesh, Neha Thakur, Pulikanti Guruprasad Reddy, Santu Nandi, Satinder K. Sharma, Subrata Ghosh
Indian Institute of Technology Mandi
Chemical Sciences
Published
Filed 2016-12-24
Published 2018-03-02
A Process For I- Line Resist Dissolution Modulation Using Hydroxy-polymer
Santu Nandi, Lalit Killare, M Yogesh, Suman Dolai, Chullikkattil P Pradeep, Satinder Sharma, Anvesh Bogavelly, Deep Narayan Tiwari, Paritosh Jain, Subrata Ghosh, Kenneth E Gonsalves, Surinder Singh